High resolution wafer inspection system

Details High resolution wafer inspection system High resolution wafer inspection system

2011-07-05

2011-07-05

Stafira, Michael P (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237100

Reexamination Certificate

active

07973919

ABSTRACT:
A method for inspecting a region, including irradiating the region via an optical system with a pump beam at a pump wavelength. A probe beam at a probe wavelength irradiates the region so as to generate returning probe beam radiation from the region. The beams are scanned across the region at a scan rate. A detector receives the returning probe radiation, and forms an image of the region that corresponds to a resolution better than pump and probe Abbe limits of the optical system. Roles of the pump and probe beams may be alternated, and a modulation frequency of the pump beam may be changed, to produce more information. Information extracted from the probe signal can also differentiate between different materials on the region.

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