High resolution two-layer resists

Details High resolution two-layer resists High resolution two-layer resists

1981-03-27

1982-10-05

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430273, 430296, G03C 168

Patent

active

043528708

ABSTRACT:
The use of a specific two-layer resist composition with a more sensitive and thicker resist as the lower layer allows the production of lines on the order of 400 A in width separated by spaces on the order of 400 A.

REFERENCES:
patent: 3668029 (1972-06-01), Blossick et al.
patent: 3764485 (1973-10-01), Jacobos
patent: 3873313 (1975-03-01), Horst et al.
patent: 3955981 (1976-05-01), Stachniak
Grobman et al., Electron Beam Lithography for 1 Micron Logic Circuit Fabrication Proceedings of the IEEE IEDN 1978, pp. 58-61.
Haller et al., Jour. of Electrochemical Society, 126, Jan. 1979, pp. 154-161.
Romankiw et al., IBM Technical Bulletin, vol. 18, No. 12, May 1976, pp. 4219-4221.

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