Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2006-03-07
2006-03-07
Lee, Sin J. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S905000, C430S910000, C430S325000, C430S326000, C430S311000, C430S319000, C430S942000, C430S914000, C430S921000, C430S966000, C430S925000, C526S279000, C526S286000, C526S287000, C526S326000
Reexamination Certificate
active
07008749
ABSTRACT:
The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite resists comprising nanoparticles in a polymer matrix are provided in this invention. New chemically amplified resists that incorporate inorganic moieties as part of the polymer are presented herein, as are new chemically amplified resists that incorporate photoacid generating groups within the polymeric chain. Novel non-chemically amplified yet photosensitive resists, and new organic-inorganic hybrid resists are also provided herein. This invention and the embodiments described herein constitute fundamentally new architectures for high resolution resists.
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Kilpatrick & Stockton LLP
Lee Sin J.
The University of North Carolina at Charlotte
Wimbish J. Clinton
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