High-resolution negative photoresist with wide process latitude

Details High-resolution negative photoresist with wide process latitude High-resolution negative photoresist with wide process latitude

1995-04-05

1997-07-22

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430905, 430921, G03F 7004

Patent

active

056502621

ABSTRACT:
The invention relates to a chemically amplified negative photoresist which can be developed in aqueous alkaline media, which contains a radiation-sensitive acid generator and a compound which reduces the solubility of the resist in aqueous alkaline solutions in the presence of acid, and a polyhydroxyl compound of the formula I ##STR1## in which n is an integer between 2 and 6,

REFERENCES:
patent: 3515552 (1970-06-01), Smith
patent: 3536489 (1970-10-01), Smith
patent: 3689572 (1972-09-01), Ruppert et al.
patent: 3779778 (1973-12-01), Smith et al.
patent: 4058400 (1977-11-01), Crivello
patent: 4058401 (1977-11-01), Crivello
patent: 4069055 (1978-01-01), Crivello
patent: 4371605 (1983-02-01), Renner
patent: 4387152 (1983-06-01), Stahlhofen
patent: 4537725 (1985-08-01), Irving
patent: 4540598 (1985-09-01), Renner et al.
patent: 4789619 (1988-12-01), Ruckert et al.
patent: 5008175 (1991-04-01), Hsieh et al.
patent: 5034304 (1991-07-01), Feely
patent: 5085972 (1992-02-01), Vogel
patent: 5112719 (1992-05-01), Yamada et al.
patent: 5164278 (1992-11-01), Brunsvold et al.
patent: 5183722 (1993-02-01), Tsutsumi et al.
patent: 5208133 (1993-05-01), Tsumori
patent: 5215856 (1993-06-01), Jayaraman
patent: 5225310 (1993-07-01), Stahlhofen et al.
patent: 5238775 (1993-08-01), Kajita et al.
patent: 5256522 (1993-10-01), Spak et al.
patent: 5286330 (1994-02-01), Schulz et al.
Oie et al., Chemical Abstracts, vol. 116, No. 2 (1992), Abstract No. 13391s JP-A-03 200 254.
Osako et al., Chemical Abstracts, vol. 117, No. 10 (1992), Abstract No. 101054k JP-A-04 012 357.
Ota et al., Chemical Abstracts, vol. 118, No. 20 (1993), Abstract No. 202087x JP-A-04 274 242.
Tokutake et al., Chemical Abstracts, vol. 115, No. 26 (1991), Abstract No. 291208t JP-A-03 158 854.
Kawada et al., Chemical Abstracts, vol. 118, No. 18 (1993), Abstract No. 180076r JP-A-04 301 851.
Houben-Weyl, Methoden der organischen Chemie, 4th Edition, vol. VI/IC "Phenole/Tiel 2" Georg Thiane Verlag Stuttgart, Germany 1976 pp. 1022-1032.
Pappas, UV Curing: Science and Technology, vol. II, Technology Marketing Corp., Norwalk, Connecticut 1985, pp. 13-25.
Ullman's Encyclopaedia of Industrial Chemistry, 4th Edition, vol. 15 (1978) pp. 613-628.

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