High resolution i-line photoresist of high sensitivity

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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430909, 430910, 430919, 430921, 430922, 522 59, 522 49, 522 53, 522116, 522126, 522 57, G03F 7038

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056270119

ABSTRACT:
The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituents;

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SPIE, vol. 920, Advances in Resist Technology and Processing V (1988) pp. 60-66 Mckean et al.
Polymer, 1983, vol. 24, pp. 995-1000 T.M.T Frechet et al "Poly(p-tert-butoxycarbonyloxystyrene): a convenient precursor to p-hydroxystryene".
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Derwent Abstract WPI Acc No: 89-243491/34 of EP 329610 Aug. 23, 1989.
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