High resistivity chromium silicide films

Details High resistivity chromium silicide films High resistivity chromium silicide films

1987-10-30

1989-07-11

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419214, 20419223, C23C 1434

Patent

active

048469491

ABSTRACT:
High resistivity chromium silicide coatings that are chemically, physically, and electrically stable at high temperatures are provided. The coatings are applied to substrates, optionally over a barrier layer of dielectric. The coatings are deposited in a magnetron sputtering process involving sputtering of a CrSi.sub.2 target in the presence of a gaseous mixture that includes nitrogen. The coatings so provided typically have resistivities on the order of 100 to 20,000 ohms per square. The degree of nitrogen incorporation varies with the thickness of the chromium silicide to give selected ranges of stable products.

REFERENCES:
patent: 4364792 (1982-12-01), Gliem et al.
patent: 4466874 (1984-08-01), Belke, Jr. et al.
patent: 4569742 (1986-02-01), Schuetz
patent: 4627902 (1986-12-01), Johnston et al.
S. Schiller et al. Thin Solid Films, vol, 96, pp. 279-284, (1982).

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