High ratio planetary drive system and method for vacuum chamber

Details High ratio planetary drive system and method for vacuum chamber High ratio planetary drive system and method for vacuum chamber

1991-01-10

1992-06-23

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 20429826, 20429827, 118719, 118730, 4272555, C23C 1422, C23C 1434

Patent

active

051240130

ABSTRACT:
A high ratio planetary drive system, a vacuum processing chamber system incorporating the planetary drive system, and a method of operating the system are disclosed. The planetary drive system provides relatively slow planetary workpiece rotation for effecting processing (deposition and reaction) of thin films, in particular, optical thin films, with complete film oxidation, controlled film uniformity, reduced bearing wear and reduced heat dissipation.

REFERENCES:
patent: 3562140 (1971-02-01), Skinner et al.
patent: 4798663 (1989-01-01), Herklotz et al.
patent: 4851095 (1989-07-01), Scobey et al.

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