High rate ion beam sputtering process

Details High rate ion beam sputtering process High rate ion beam sputtering process

1994-02-14

1995-07-04

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429804, C23C 1434

Patent

active

054297320

ABSTRACT:
An ion beam sputtering process for fabricating a multilayer optical coating. The process adds energy to surface atoms of a sputtering target to increase deposition rates of atoms comprising the optical coating, thereby improving yield. The present process comprises providing a sputtering chamber. A sputtering target having a predetermined binding energy is disposed in the sputtering chamber, along with an optical element onto which a multilayer optical coating is to be deposited. The sputtering chamber is then pressurized to a predetermined sputtering pressure. Energy is then applied to the sputtering target to increase the vibrational energy of surface atoms and mean target energy thereof, thereby decreasing the amount of energy required to sputter atoms from the surface of the sputtering target onto the surface of the optical element. Energy may be added to the surface atoms of the sputtering target by adding acoustic (ultrasonic) energy, by irradiating the surface of the target using a laser, or by causing lattice strain in the target.

REFERENCES:
patent: 4793908 (1988-12-01), Scott et al.
patent: 4885070 (1989-12-01), Campbell et al.
patent: 5017277 (1991-05-01), Yoshida et al.
patent: 5037521 (1991-08-01), Nishikawa et al.
patent: 5064520 (1991-11-01), Miyake et al.
patent: 5082545 (1992-01-01), Tanaka et al.
patent: 5207884 (1993-05-01), Char et al.
"Acoustical Engineering", H. Olson, D. Van Nostrand Co., 1967, pp. 692-703.

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