High-quality CMOS image sensor and photo diode

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S444000, C257SE27132

Reexamination Certificate

active

07741665

ABSTRACT:
Provided are a high-quality CMOS image sensor and a photo diode, which can be fabricated in sub-90 nm regime using nanoscale CMOS technology. The photo diode includes: a p-type well; an internal n-type region formed under a surface of the p-type well; and a surface p-type region including a highly doped p-type SiGeC epitaxial layer or a polysilicon layer deposited on a top surface of the p-type well over the internal n-type region. The image sensor includes: a photo diode including an internal n-type region and a surface p-type region; a transfer transistor for transmitting photo-charges generated in the photo diode to a floating diffusion node; and a driving transistor for amplifying a variation in an electric potential of the floating diffusion node due to the photo-charges. The image sensor further includes a floating metal layer for functioning as the floating diffusion node and applying an electric potential from a drain of the transfer transistor to a gate of the driving transistor.

REFERENCES:
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patent: 6690000 (2004-02-01), Muramatsu et al.
patent: 6974943 (2005-12-01), Manabe et al.
patent: 2006/0054988 (2006-03-01), Kanbe
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Masayuki Furumiya, et al; “High-Sensitivity and No-Crosstalk Pixel Technology for Embedded CMOS Image Sensor;” IEEE Transactions on Electron Devices, vol. 48, No. 10, Oct. 2001.

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