Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2007-10-16
2010-06-22
Pham, Hoai V (Department: 2892)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S444000, C257SE27132
Reexamination Certificate
active
07741665
ABSTRACT:
Provided are a high-quality CMOS image sensor and a photo diode, which can be fabricated in sub-90 nm regime using nanoscale CMOS technology. The photo diode includes: a p-type well; an internal n-type region formed under a surface of the p-type well; and a surface p-type region including a highly doped p-type SiGeC epitaxial layer or a polysilicon layer deposited on a top surface of the p-type well over the internal n-type region. The image sensor includes: a photo diode including an internal n-type region and a surface p-type region; a transfer transistor for transmitting photo-charges generated in the photo diode to a floating diffusion node; and a driving transistor for amplifying a variation in an electric potential of the floating diffusion node due to the photo-charges. The image sensor further includes a floating metal layer for functioning as the floating diffusion node and applying an electric potential from a drain of the transfer transistor to a gate of the driving transistor.
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Masayuki Furumiya, et al; “High-Sensitivity and No-Crosstalk Pixel Technology for Embedded CMOS Image Sensor;” IEEE Transactions on Electron Devices, vol. 48, No. 10, Oct. 2001.
Kang Jin Yeong
Koo Jin Gun
Lee Sang Heung
Electronics and Telecommunications Research Institute
Ladas & Parry LLP
Pham Hoai V
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