High-purity, opaque quartz glass, method for producing same and

Details High-purity, opaque quartz glass, method for producing same and High-purity, opaque quartz glass, method for producing same and

1994-10-07

1996-12-17

Turner, Archene

Stock material or miscellaneous articles

Web or sheet containing structurally defined element or...

Composite having voids in a component

428178, 4283126, 428398, 428446, 501 53, 501 54, 65 172, 65 173, 65 174, 65 176, 65120, 65DIG8, 65DIG9, C03B 1908

Patent

active

055851738

ABSTRACT:
The high-purity, opaque quartz glass containing 3.times.10.sup.6 -9.times.10.sup.6 of closed cells having an average size of 20-40 .mu.m per 1 cm.sup.3, a ratio of closed cells having sizes of 100 .mu.m or more to the whole of cells being 1% or less, thereby showing 5% or less of linear transmittance for near infrared rays (.lambda.=900 nm) at a thickness of 1 mm is produced by compacting amorphous silica powder having an average particle size of 0.5-10 .mu.m, in which each of impurities selected from Li, Na, K, Fe, Ti and Al is 1 ppm or less, if any, and sintering the resultant green body at 1730.degree.-1850.degree. C.

REFERENCES:
patent: 3620702 (1971-11-01), DeKalb
patent: 3837825 (1974-09-01), Loxley et al.
patent: 4072489 (1978-02-01), Loxley
patent: 4810674 (1989-03-01), Che
Glass and Ceramics, vol. 48, No. 7/8, Jul/Aug. 1991, pp. 285-287, T. I. Prokhorova, et al., "A New Material-Quartz Light-Diffusing Glass".

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