High pressure processing apparatus and method

Details High pressure processing apparatus and method High pressure processing apparatus and method

2006-07-25

2006-07-25

Perrin, Joseph L. (Department: 1746)

Cleaning and liquid contact with solids

Apparatus

With plural means for supplying or applying different fluids...

C134S103100, C134S186000, C134S902000

Reexamination Certificate

active

07080651

ABSTRACT:
When the hatch of a substrate washing chamber5is opened to receive a substrate, certain valves are closed, and one valve is opened, to supply CO2to purge the substrate washing chamber5to and exclude air. When the hatch is closed, another valve is opened to vent substrate washing chamber5so that the CO2expels any gas and unwanted air from the substrate washing chamber5and the conduits. Thereafter, supercritical CO2is used to wash the substrate and clean the circulation line. The flow of supercritical CO2is sent to the substrate washing chamber5. After flowing through the circulation line, including a circulation channel11, it passes through a bypass channel12to a decompressor7. Any chemicals or organic substances left in the circulation line are continuously sent to separation/recovery bath8together with the flow.

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