High-pressure delivery system for ultra high purity liquid...

Details High-pressure delivery system for ultra high purity liquid... High-pressure delivery system for ultra high purity liquid...

2006-07-04

2006-07-04

Tyler, Cheryl (Department: 3744)

Refrigeration

Cryogenic treatment of gas or gas mixture

Separation of gas mixture

C062S050200, C062S602000, C062S928000

Reexamination Certificate

active

07069742

ABSTRACT:
This invention relates to an improvement in a process and apparatus for delivering ultra high purity liquid carbon dioxide to a point of use at pressures above ambient without pumping. In the process a high purity carbon dioxide feed is charged to a vessel and at least partially solidified. Once filled, the slush or solid is isochorically heated, i.e., heated at constant vessel volume whereby the solid phase carbon dioxide is converted to a liquid. Liquid, then, is withdrawn from the vessel at a desired pressure at a rate at which the solid phase carbon dioxide is converted to a liquid. The improvement resides in effecting partial solidification and recycle of carbon dioxide.

REFERENCES:
patent: 2551399 (1951-05-01), Silverberg
patent: 3317278 (1967-05-01), Ruhemann et al.
patent: 5377705 (1995-01-01), Smith, Jr. et al.
patent: 5772783 (1998-06-01), Stucker
patent: 5894742 (1999-04-01), Friedt
patent: 5908510 (1999-06-01), McCullough et al.
patent: 6023933 (2000-02-01), Langan et al.
patent: 6327872 (2001-12-01), Boyd et al.
patent: 2002327895 (2002-11-01), None
patent: WO 03/033114 (2003-04-01), None
patent: WO 03/033428 (2003-04-01), None

Affiliated with

Also associated with

Rating

High-pressure delivery system for ultra high purity liquid... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High-pressure delivery system for ultra high purity liquid..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High-pressure delivery system for ultra high purity liquid... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3530466