High power, long focus electron source for beam processing

Details High power, long focus electron source for beam processing High power, long focus electron source for beam processing

2007-07-31

2007-07-31

Dinh, Trinh Vo (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111810

Reexamination Certificate

active

11143417

ABSTRACT:
Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.

REFERENCES:
patent: 4800100 (1989-01-01), Herbots et al.
patent: 4888776 (1989-12-01), Dolezal et al.
patent: 4963823 (1990-10-01), Otto et al.
patent: 5534677 (1996-07-01), Elmer et al.
patent: 5783914 (1998-07-01), Hiramoto et al.
patent: 6683318 (2004-01-01), Haberer et al.
patent: 2004/0002202 (2004-01-01), Horsky et al.
patent: 2004/0113099 (2004-06-01), Eickhoff et al.

Affiliated with

Also associated with

Rating

High power, long focus electron source for beam processing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High power, long focus electron source for beam processing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High power, long focus electron source for beam processing will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3780974