High performance curable polymers and processes for the preparat

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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4302871, 430311, 430325, 522162, 522166, 522170, 522149, 525536, 525471, 525534, G03F 7038, G03F 726

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059452536

ABSTRACT:
Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are allyl ether groups, epoxy groups, or mixtures thereof. Also disclosed are a process for preparing a thermal ink jet printhead containing the aforementioned polymers and processes for preparing the aforementioned polymers.

REFERENCES:
patent: 2125968 (1938-08-01), Theimer
patent: 3367914 (1968-02-01), Herbert
patent: 3455868 (1969-07-01), D'Alessandro
patent: 3914194 (1975-10-01), Smith
patent: 4086209 (1978-04-01), Hara et al.
patent: 4110279 (1978-08-01), Nelson et al.
patent: 4435496 (1984-03-01), Walls et al.
patent: 4448948 (1984-05-01), Tsubaki et al.
patent: 4623558 (1986-11-01), Lin
patent: 4667010 (1987-05-01), Eldin
patent: 5268444 (1993-12-01), Jensen et al.
patent: 5336720 (1994-08-01), Richards et al.
patent: 5438082 (1995-08-01), Helmer-Metzmann et al.
patent: 5561202 (1996-10-01), Helmer-Metzmann et al.
patent: 5681888 (1997-10-01), Nomura et al.
patent: 5753783 (1998-05-01), Fuller et al.
Kirk-Othmer Encyclopedia of Chemical Technology, Fourth Edition, vol. 9, John Wiley & Sons, Inc, New York, N.Y., 1994, pp. 322 and 343.
A Simple and Inexpensive Procedure for Chloromethylation of Certain Aromatic Compounds, Tetrahedron Letters vol. 24, No. 18, pp. 1933-1936, (1983) Alexander McKillop, Fereidon Abbast Madydabade and David A. Long.
Synthesis of Intermediates for Production of Heat Resistant Polymers (Chloromethylation of Diphenyl Oxide) Zhurral Priklalnoc Khimie, vol. 40 No. 11, pp. 2540-2546 Nov., 1967.
Functional Polymers and Sequential copolymers by phase transfer catalysis, 3a, Makronal. Chem. 185, 2319-2336 (1984) Virgil Percec, Brian C. Auman.
Functional Polymers and Sequential Copolymers by Phase Transfer Catalysis-Polymer Bulletin 10, 223-230 (1983) Virgil Percec and Peter L. Rinalde.
A New Preparation of Chloromethyl Methyl Ether Free of Bis(chloromethyl) Ether. Synthesis 970 (1979) J. S. Anato, S. Karady, M. Stetzinger,L. M. Weinstock.
"Flare, A Low Dielectric Constant, High T9 Thermally Stable Poly(arylene) Ether) . . . "Polymer Preprints 37 (1) 150 (1996) N. H. Hendricks and K. S. Y. Lau.
Styrenl Terminated Resins as Interhead Dielectric for Multichip Modules 32 (2) 178 (1991) Joseph J. Zupancic, Daniel C. Blazey, Thomas G. Baker, and Edmund A. Dinkel.
Functional polymers and sequential copolymers by phase transfer catalysis 2.sup.a Makromol Chem., 185, 1867-1880 (1984) Virgil Percec*, Brian C. Auman.
Deep UV Photochemistry of Copolymers of Trimethlsilmethyl Methacrylate and Chloromethylstyrene. Polymer Preprints 29(1) 1988 M. J. Jurek, A. E. Novembre, I.P. Aeyward, R. Gooden, E. Reichmanis.
Poly (arylene ethers) Polymer vol. 29, 1988, Feb. pp. 358 P.M. Hergenrother, B.J. Jensen, & S.J. Havens.
Ethynyl-Terminated Polyarylates: Synthesis & Characterization J. Polymer Science: Polymer Chemistry Ed. vol. 22 3011-3025(1984) ccc 0360-6376/84/113011-15304.00 S.J.Havens, P.M. Hergenrother.
Chloromethylation of Condensation Polymers Conf. An OXY-1, 4 Phenylene Backbone, Polymer Preprints (1979) vol. 20(1), 835 Jim H. Daley, supon Chotiward & Ralph Nielsen.
Chloromethylstyrene: Synthesis, Polymerization, Transformations, application JMS-Rev. Micromal, Chem. Phys. Cz2 (3), 343-407 (1982-83) Marcel Camps, Michael Chatzopoulos & Jean-Pierce Monthiard.
Pulse Radiolysis studies on the mechanism of the High Sensitivity of Chloromethylated Polyptryrene as an Electron Negative Resist. Lithography 25(1) 287 (1984) Y.Tabata, S. Tagaiva, & M. Washio.

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