Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1995-02-06
1996-01-23
Powell, William
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419217, 20419222, 20419223, 216 6, C23C 1400, C23C 1432
Patent
active
054862779
ABSTRACT:
A high performance capacitor fabricated from nano-structure multilayer materials, such as by controlled, reactive sputtering, and having very high energy-density, high specific energy and high voltage breakdown. The multilayer capacitors, for example, may be fabricated in a "notepad" configuration composed of 200-300 alternating layers of conductive and dielectric materials so as to have a thickness of 1 mm, width of 200 mm, and length of 300 mm, with terminals at each end of the layers suitable for brazing, thereby guaranteeing low contact resistance and high durability. The "notepad" capacitors may be stacked in single or multiple rows (series-parallel banks) to increase the voltage and energy density.
REFERENCES:
patent: 4058445 (1977-11-01), Anders
patent: 4695197 (1987-08-01), Tigelaar et al.
patent: 5203977 (1993-04-01), Makowiecki et al.
Barbee, Jr. Troy W.
Johnson Gary W.
O'Brien Dennis W.
Carnahan L. E.
Powell William
Regents of the University of California
Sartorio Henry P.
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