High molecular weight silicone compounds, chemically amplified p

Details High molecular weight silicone compounds, chemically amplified p High molecular weight silicone compounds, chemically amplified p

1998-03-09

2000-05-23

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430326, 430330, 430905, 528 40, G03F 7004

Patent

active

060664339

ABSTRACT:
In a silicone polymer having phenolic hydroxyl groups, the hydrogen atoms of some of the phenolic hydroxyl groups are replaced by acid labile groups of at least one type. The silicone polymer is crosslinked at some of the remaining phenolic hydroxyl groups with crosslinking groups having C--O--C linkages within a molecule and/or between molecules. The silicone polymer has a Mw of 5,000 to 50,000. A chemically amplified positive resist composition comprising the silicone polymer as a base resin has a high sensitivity and resolution so that it is suitable for fine patterning with electron beams or deep UV. Because of improved oxygen plasma etching resistance, the composition is suitable for use in the two-layer resist technique.

REFERENCES:
patent: 5773192 (1998-06-01), Murai et al.
JP 6118651 A (English abstract).

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