HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND...

Details HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND... HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND...

2005-12-13

2005-12-13

Thornton, Yvette C. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S311000, C430S330000, C430S313000, C430S905000, C430S907000, C430S910000, C568S670000, C549S504000

Reexamination Certificate

active

06974658

ABSTRACT:
Disclosed is a polymer compound for photoresist characterized in that the polymer compound is formed of a polymer compound having at least one skeleton represented by the following general formula (1), general formula (2A), general formula (2B) or general formula (2C):

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