HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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Details

C430S311000, C430S330000, C430S313000, C430S905000, C430S907000, C430S910000, C568S670000, C549S504000

Reexamination Certificate

active

06974658

ABSTRACT:
Disclosed is a polymer compound for photoresist characterized in that the polymer compound is formed of a polymer compound having at least one skeleton represented by the following general formula (1), general formula (2A), general formula (2B) or general formula (2C):

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