High mobility CMOS circuits

Details High mobility CMOS circuits High mobility CMOS circuits

2006-03-21

2006-03-21

Loke, Steven (Department: 2811)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S154000, C438S157000, C438S197000, C257S351000, C257S368000, C257S369000, C257S635000, C257S637000, C257S639000

Reexamination Certificate

active

07015082

ABSTRACT:
A semiconductor device has selectively applied thin tensile films and thin compressive films, as well as thick tensile films and thick compressive films, to enhance electron and hole mobility in CMOS circuits. Fabrication entails steps of applying each film, and selectively removing each applied film from areas that would not experience performance benefit from the applied stressed film.

REFERENCES:
patent: 3602841 (1971-08-01), McGroddy
patent: 4665415 (1987-05-01), Esaki et al.
patent: 4853076 (1989-08-01), Tsaur et al.
patent: 4855245 (1989-08-01), Neppl et al.
patent: 4952524 (1990-08-01), Lee et al.
patent: 4958213 (1990-09-01), Eklund et al.
patent: 5006913 (1991-04-01), Sugahara et al.
patent: 5060030 (1991-10-01), Hoke
patent: 5081513 (1992-01-01), Jackson et al.
patent: 5108843 (1992-04-01), Ohtaka et al.
patent: 5134085 (1992-07-01), Gilgen et al.
patent: 5310446 (1994-05-01), Konishi et al.
patent: 5354695 (1994-10-01), Leedy
patent: 5371399 (1994-12-01), Burroughes et al.
patent: 5391510 (1995-02-01), Hsu et al.
patent: 5459346 (1995-10-01), Asakawa et al.
patent: 5471948 (1995-12-01), Burroughes et al.
patent: 5557122 (1996-09-01), Shrivastava et al.
patent: 5561302 (1996-10-01), Candelaria
patent: 5565697 (1996-10-01), Asakawa et al.
patent: 5571741 (1996-11-01), Leedy
patent: 5592007 (1997-01-01), Leedy
patent: 5592018 (1997-01-01), Leedy
patent: 5670798 (1997-09-01), Schetzina
patent: 5679965 (1997-10-01), Schetzina
patent: 5683934 (1997-11-01), Candelaria
patent: 5840593 (1998-11-01), Leedy
patent: 5861651 (1999-01-01), Brasen et al.
patent: 5880040 (1999-03-01), Sun et al.
patent: 5940736 (1999-08-01), Brady et al.
patent: 5946559 (1999-08-01), Leedy
patent: 5960297 (1999-09-01), Saki
patent: 5989978 (1999-11-01), Peidous
patent: 6008126 (1999-12-01), Leedy
patent: 6025280 (2000-02-01), Brady et al.
patent: 6046464 (2000-04-01), Schetzina
patent: 6066545 (2000-05-01), Doshi et al.
patent: 6090684 (2000-07-01), Ishitsuka et al.
patent: 6107143 (2000-08-01), Park et al.
patent: 6117722 (2000-09-01), Wuu et al.
patent: 6133071 (2000-10-01), Nagai
patent: 6165383 (2000-12-01), Chou
patent: 6221735 (2001-04-01), Manley et al.
patent: 6228694 (2001-05-01), Doyle et al.
patent: 6235574 (2001-05-01), Tobben et al.
patent: 6246095 (2001-06-01), Brady et al.
patent: 6255169 (2001-07-01), Li et al.
patent: 6261964 (2001-07-01), Wu et al.
patent: 6265317 (2001-07-01), Chiu et al.
patent: 6274444 (2001-08-01), Wang
patent: 6281532 (2001-08-01), Doyle et al.
patent: 6284623 (2001-09-01), Zhang et al.
patent: 6284626 (2001-09-01), Kim
patent: 6319794 (2001-11-01), Akatsu et al.
patent: 6361885 (2002-03-01), Chou
patent: 6362082 (2002-03-01), Doyle et al.
patent: 6368931 (2002-04-01), Kuhn et al.
patent: 6403486 (2002-06-01), Lou
patent: 6403975 (2002-06-01), Brunner et al.
patent: 6406973 (2002-06-01), Lee
patent: 6461936 (2002-10-01), von Ehrenwall
patent: 6476462 (2002-11-01), Shimizu et al.
patent: 6483154 (2002-11-01), Ngo et al.
patent: 6493497 (2002-12-01), Ramdani et al.
patent: 6498358 (2002-12-01), Lach et al.
patent: 6501121 (2002-12-01), Yu et al.
patent: 6506652 (2003-01-01), Jan et al.
patent: 6521964 (2003-02-01), Jan et al.
patent: 6531369 (2003-03-01), Ozkan et al.
patent: 6531740 (2003-03-01), Bosco et al.
patent: 6573172 (2003-06-01), En et al.
patent: 6509618 (2003-07-01), Jan et al.
patent: 2001/0009784 (2001-07-01), Ma et al.
patent: 2002/0074598 (2002-06-01), Doyle et al.
patent: 2002/0086472 (2002-07-01), Roberds et al.
patent: 2002/0086497 (2002-07-01), Kwok
patent: 2002/0090791 (2002-07-01), Doyle et al.
patent: 2003/0032261 (2003-02-01), Yeh et al.
patent: 2003/0040158 (2003-02-01), Saitoh
patent: 2003/0057184 (2003-03-01), Yu et al.
patent: 2003/0067035 (2003-04-01), Tews et al.
patent: 2004/0135234 (2004-07-01), Morin et al.
Kern Rim, et al., “Transconductance Enhancement in Deep Submicron Strained-Si n-MOSFETs”, International Electron Devices Meeting, 26, 8, 1, IEEE, Sep. 1998.
Kern Rim, et al., “Characteristics and Device Design of Sub-100 nm Strained Si N- and PMOSFETs”, 2002 Symposium On VLSI Technology Digest of Technical Papers, IEEE, pp 98-99.
Gregory Scott, et al., “NMOS Drive Current Reduction Caused by Transistor Layout and Trench Isolation Induced Stress”, International Electron Devices Meeting, 34.4.1, IEEE, Sep. 1999.
F. Ootsuka, et al., “A Highly Dense, High-Performance 130nm node CMOS Technology for Large Scale System-on-a-Chip Application”, International Electron Devices Meeting, 23.5.1, IEEE, Apr. 2000.
Shinya Ito, et al., “Mechanical Stress Effect of Etch-Stop Nitride and its Impact on Deep Submicron Transistor Design”, International Electron Devices Meeting, 10.7.1, IEEE, Apr. 2000.
A. Shimizu, et al., “Local Mechanical-Stress Control (LMC): A New Technique for CMOS-Performance Enhancement”, International Electron Devices Meeting, IEEE, Mar. 2001.
K. Ota, et al., “Novel Locally Strained Channel Technique for high Performance 55nm CMOS”, International Electron Devices Meeting, 2.2.1, IEEE, Feb. 2002.

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