High-k dielectric for thermodynamically-stable...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257S411000

Reexamination Certificate

active

10404876

ABSTRACT:
Excellent capacitor-voltage characteristics with near-ideal hysteresis are realized in a capacitive-like structure that uses an electrode substrate-type material with a high-k dielectric layer having a thickness of a few-to-several Angstroms capacitance-based SiO2equivalent (“TOx, Eq”). According to one particular example embodiment, a semiconductor device structure has an electrode substrate-type material having a Germanium-rich surface material. The electrode substrate-type material is processed to provide this particular electrode surface material in a form that is thermodynamically stable with a high-k dielectric material. A dielectric layer is then formed over the electrode surface material with the high-k dielectric material at a surface that faces, lies against and is thermodynamically stable with the electrode surface material.

REFERENCES:
patent: 4879256 (1989-11-01), Bean et al.
patent: 4959694 (1990-09-01), Gell
patent: 5646058 (1997-07-01), Taur et al.
patent: 6214712 (2001-04-01), Norton
patent: 6335238 (2002-01-01), Hanttangady et al.
patent: 6403434 (2002-06-01), Yu
patent: 6455330 (2002-09-01), Yao et al.
patent: 6486520 (2002-11-01), Okuno et al.
patent: 6495437 (2002-12-01), Yu
patent: WO03/096390 (2003-11-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High-k dielectric for thermodynamically-stable... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High-k dielectric for thermodynamically-stable..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High-k dielectric for thermodynamically-stable... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3729370

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.