High gel rigidity, negative electron beam resists

Details High gel rigidity, negative electron beam resists High gel rigidity, negative electron beam resists

1980-10-27

1982-03-09

Newsome, John H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

2041592, 20415922, 427 431, B05D 306

Patent

active

043189768

ABSTRACT:
A negative, high energy radiation resist based on styrene-allyl methacrylate copolymers and substitutional modifications thereof, yielding a linear copolymer with highly sensitive allyl pendant groups together with a thermally stable, solvent resistant backbone. This resist exhibits improved e-beam sensitivity without the attendant problems of swelling during development and flow during heat processing.

REFERENCES:
patent: 4110187 (1978-08-01), Sloan et al.
patent: 4208211 (1980-06-01), Bowden et al.
patent: 4267258 (1981-05-01), Yoneda et al.

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