High frequency power source having corrected power output

Details High frequency power source having corrected power output High frequency power source having corrected power output

1994-09-07

1996-08-06

Pascal, Robert

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

31511141, 31511151, H05H 124, H03H 738

Patent

active

055436897

ABSTRACT:
A high frequency power source of the invention comprises power supplying means for amplifying a high frequency signal and for supplying high frequency power; and output regulation means for monitoring the high frequency power and regulating the power supplying means according to the high frequency power.
A plasma generator comprises a chamber for generating plasma on the basis of high frequency power; and an high frequency power supply for supplying high frequency power to the chamber, the high frequency power supply includes, power supplying means for amplifying a high frequency signal and supplying high frequency power; and output regulation means for monitoring the high frequency power and power supplying means and regulating the power supplying means according to the high frequency power.
Another plasma generator comprises supplying means amplifying a DC signal or AC signal with a predetermined frequency for supplying a microwave; a detector for detecting the state of the microwave; a matching circuit for making impedance matching with respect to the microwave; and regulation means for monitoring the microwave and regulating the power of the microwave.

REFERENCES:
patent: 4629940 (1986-12-01), Gagne et al.
patent: 5383019 (1995-01-01), Farrell et al.

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