Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate
2008-01-29
2008-01-29
Hassanzadeh, Parviz (Department: 1763)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
Having glow discharge electrode gas energizing means
C118S7230ER
Reexamination Certificate
active
10341353
ABSTRACT:
This application discloses a High-Frequency plasma processing apparatus comprising a process chamber in which a substrate to be processed is placed, a process-gas introduction line for introducing a process gas into the process chamber, a first HF electrode provided in the process chamber, a first HF power source for applying voltage to the first HF electrode, thereby generating plasma of the process gas. The apparatus further comprises a second HF electrode facing the first HF electrode in the process chamber, interposing discharge space, and a series resonator connecting the second electrode and the ground. The frequency of the first HF power source is not lower than 30 MHz. The series resonator is resonant as the distributed constant circuit at the frequency of the first HF power source.
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Les Besser et al.; “Practical RF Circuit Design for Modern Wireless Systems”; pp. 42-43; vol. 1, Artech House Inc., 2003.
Ikeda Masayoshi
Sago Yasumi
Sato Hisaaki
Tsuchiya Nobuaki
Canon Anelva Corporation
Crowell Michelle
Hassanzadeh Parviz
Hogan & Hartson LLP
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