High frequency plasma power source and impedance matching device

Details High frequency plasma power source and impedance matching device High frequency plasma power source and impedance matching device

1993-05-05

1995-02-28

Pascal, Robert J.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

315219, 315244, 330301, H01J 724

Patent

active

053940610

ABSTRACT:
In a high frequency plasma power supply comprising a final stage push-pull amplifier 2 with each phase having a parallel combination of at least two FETs, an output transformer 5 having the connection of the phase outputs of the push-pull amplifier 2 to the opposite terminals of a primary winding with a neutral tap, and a low pass filler 6 allowing passage of substantially the fundamental frequency component from the secondary winding output of the output transformer 5, the high frequency power passing through the low pass filter being supplied between the electrodes of a plasma chamber 10 through an impedance matching circuit 9 having an impedance adjusting mechanism,

REFERENCES:
patent: 4945317 (1990-07-01), Sato et al.
patent: 5008894 (1991-04-01), Laakmann
patent: 5079507 (1992-01-01), Ishida et al.

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