High frequency plasma generator and high frequency plasma...

Details High frequency plasma generator and high frequency plasma... High frequency plasma generator and high frequency plasma...

2006-11-28

2006-11-28

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Radiation or energy treatment modifying properties of...

C118S7230ER, C257SE31001

Reexamination Certificate

active

07141516

ABSTRACT:
An object is to provide a high-frequency plasma generating apparatus and process which can further advance uniformity of the thickness of a film on a substrate with a large area in comparison with conventional apparatuses. In a reaction chamber (1), a ground electrode (3) is disposed, and a discharge electrode (2) is disposed opposite to the ground electrode (3). A substrate (4) as a processing object is placed in close contact with the ground electrode (3). A high-frequency voltage is applied to the discharge electrode (2) so as to generate plasma between the ground electrode and the discharge electrode. An RF electric power supply (15) generates a first high-frequency voltage, and outputs the generated voltage on feeding points (9) disposed on a lateral portion of the discharge electrode (2). An RF electric power supply (16) generates a second high-frequency voltage, and outputs the generated voltage on feeding points (9) disposed on another lateral portion of the discharge electrode (2). Here, the second high-frequency voltage has the same frequency as that of the first high-frequency voltage and has a phase which varies with a low-frequency signal, which is modulated by a predetermined modulation signal.

REFERENCES:
patent: 5571366 (1996-11-01), Ishii et al.
patent: 6353201 (2002-03-01), Yamakoshi et al.
patent: 6380684 (2002-04-01), Li et al.
patent: 6456010 (2002-09-01), Yamakoshi et al.
patent: 6720268 (2004-04-01), Laermer et al.
patent: 6835279 (2004-12-01), Li et al.
patent: 2001/0021422 (2001-09-01), Yamakoshi et al.
patent: 2005/0255255 (2005-11-01), Kawamura et al.
patent: 5-291155 (1993-11-01), None
patent: 2001-257098 (2001-09-01), None
patent: 2001-274099 (2001-10-01), None
patent: 2002-327276 (2002-11-01), None
patent: 2003-264152 (2003-09-01), None

Affiliated with

Also associated with

Rating

High frequency plasma generator and high frequency plasma... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High frequency plasma generator and high frequency plasma..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High frequency plasma generator and high frequency plasma... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3674506