High-frequency feeding method for use in plasma apparatus and de

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

31323131, 333 32, H05H 124

Patent

active

050774999

ABSTRACT:
In a plasma apparatus, electric power is transmitted from a high-frequency power supply to an electrode in a plasma chamber through a feeding cable. A stub connected to the feeding cable as a matching component removes the capacitive component of the impedance of a plasma produced in the plasma chamber and equalizes the resistive component of the impedance of the plasma to the characteristic impedance of the feeding cable. As a result, the impedance of the plasma and the characteristic impedance of the feeding cable are matched, and the transmitting efficiency of the electric power is enhanced. A phase shift circuit may be used instead of the stub.

REFERENCES:
patent: 3569777 (1971-03-01), Beaudry
patent: 4792732 (1988-12-01), O'Loughlin
patent: 4877999 (1989-10-01), Knapp et al.
patent: 4887005 (1989-12-01), Rough et al.
patent: 4956582 (1990-09-01), Bourassa

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High-frequency feeding method for use in plasma apparatus and de does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High-frequency feeding method for use in plasma apparatus and de, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High-frequency feeding method for use in plasma apparatus and de will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1512594

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.