High-frequency electron source

Details High-frequency electron source High-frequency electron source

2005-03-22

2005-03-22

Vo, Tuyet Thi (Department: 2821)

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Plasma generating

C315S111210, C250S281000, C250S283000, C118S7230VE, C118S7230AN

Reexamination Certificate

active

06870321

ABSTRACT:
A high-frequency electron source includes a discharge chamber having at least one gas inlet for a gas to be ionized and at least one extraction opening for electrons. The high-frequency electron source also includes a first electrode at least partially surrounding the discharge chamber and a keeper electrode at least partially surround the discharge chamber. The first electrode and the keeper electrode are configured to provide a high-frequency electric field therebetween.

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patent: 6335595 (2002-01-01), Nishikawa et al.
patent: 62185324 (1987-08-01), None

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