High energy radiation curable resist material and method of usin

Details High energy radiation curable resist material and method of usin High energy radiation curable resist material and method of usin

1978-08-09

1981-11-10

Newsome, John H.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

96 351, 96 362, 20415916, 20415922, 430280, 430296, 430313, B05D 306, G03C 171

Patent

active

042999111

ABSTRACT:
A resist material curable by irradiation with high energy radiation such as electron beams, X-rays, ion beams, neutron beams, .gamma.-rays or deep ultraviolet light but substantially non-curable by irradiation with light having a wavelength of about 300 nm or more, the resist material comprising, as a main component, a solvent-soluble polymer containing an ethylenically unsaturated double bond, the polymer being obtained by reacting (a) a polymer having a plurality of oxirane rings therein and (b) a monomer containing (i) at least one ethylenically unsaturated double bond and (ii) one functional group capable of opening the oxirane rings, and then opening the unreacted oxirane rings.

REFERENCES:
patent: 3418295 (1968-12-01), Schoenthaler
patent: 3770433 (1973-11-01), Bartelt et al.
patent: 3923523 (1975-12-01), Nishikubo et al.
patent: 3980483 (1976-09-01), Nishikubo et al.
patent: 4049745 (1977-09-01), Schuster et al.

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