High energy, low energy density, radiation-resistant optics...

Details High energy, low energy density, radiation-resistant optics... High energy, low energy density, radiation-resistant optics...

2005-05-10

2005-05-10

Thompson, Timothy (Department: 2873)

Optical: systems and elements

Optical modulator

Light wave temporal modulation

C359S290000, C359S292000

Reexamination Certificate

active

06891655

ABSTRACT:
The present invention includes methods and devices that improve the radiation-resistance of a movable micromechanical optical element. In particular, a radiation-resistant layer is added to a movable micro-mechanical optical element, suitable to reduce the surface and bulk material changes to the element that result from exposure to pulsed laser energy densities less than 100 micro-joules per square centimeter and at wavelengths less than or equal to about 248 nm.

REFERENCES:
patent: 6392233 (2002-05-01), Channin et al.
patent: 20030016337 (2003-01-01), Duncan et al.
H. Helvajian et al. “Photophysical Processes in Low-fluence UV Laser-Material Interaction and the Relevance to Atomic Layer Processing” presented at NATO/ASI Workshop, Portugal, Advanced Materials for Optics and Electronics, vol. 2, 31-42 (1993).
D.G. Stearns et al. “Nonspecular Scattering in EUV Lithography: Determining Specifications for Surface Finish” OSA TOPS on Extreme Ultraviolet Lithography 1996, vol. 4, Optical Society of America, pp. 167-168.
P. Kadkhoda et al. “Investigation on Total Scattering at 157nm and 193nm” Proc. SPIE vol. 4099, pp. 65-73, Nov. 2000.
Angela Duparre et al. “Influence of Substrate Surface and Film Roughness on the Quality of Optical Coatings for the UV Spectral Region” Proc. SPIE vol. 3110, p. 509-516, Sep. 1997.
N. Kaiser et al. “High Damage Threshold A12O3/SiO2 Dielectric Coatings for Excimer Lasers” Thin Solid Films 260 (1995) pp. 86-92.

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