Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate
2008-02-11
2011-10-25
MacArthur, Sylvia R. (Department: 1716)
Coating apparatus
Gas or vapor deposition
Work support
C156S345510, C361S234000, C279S128000
Reexamination Certificate
active
08043433
ABSTRACT:
The present invention generally provides a high efficiency electrostatic chuck for holding a substrate in a processing volume. The high efficiency electrostatic chuck includes an electrode embedded within a high-purity, thermoplastic member. In particular, the high-purity, thermoplastic member may include a high-purity, polyaryletherketone having an extremely low level of metallic ions present therein. The high-purity, polyaryletherketone has excellent wear resistance, high temperature resistance, plasma resistance, corrosive chemical resistance, electrical stability, and strength as compared to polyimide films used in electrostatic chucks. The present invention also provides a simplified method of manufacturing the high efficiency electrostatic chuck.
REFERENCES:
patent: 5606485 (1997-02-01), Shamouilian et al.
patent: 5691876 (1997-11-01), Chen et al.
patent: 5745331 (1998-04-01), Shamouilian et al.
patent: 5753132 (1998-05-01), Shamouilian et al.
patent: 5822171 (1998-10-01), Shamouilian et al.
patent: 5986875 (1999-11-01), Donde et al.
patent: 6094334 (2000-07-01), Bedi et al.
patent: 6219219 (2001-04-01), Hausmann et al.
patent: 6490144 (2002-12-01), Narendrnath et al.
patent: 6557248 (2003-05-01), Shamouilian et al.
patent: 6709609 (2004-03-01), Hwang et al.
ThomasNet. Manufactured Polymer Meets Strict Requirements for Purity. Jul. 21, 2004. Published by ThomasNet. Printed on Jul. 28, 2009 from http:/
ews.thomasnet.com/fullstory/453647.
International Search Report and Written Opinion dated Sep. 17, 2009 for International Application No. PCT/US2009/033032.
Applied Materials Inc.
MacArthur Sylvia R.
Patterson & Sheridan L.L.P.
LandOfFree
High efficiency electro-static chucks for semiconductor... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High efficiency electro-static chucks for semiconductor..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High efficiency electro-static chucks for semiconductor... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4261146