High efficiency electro-static chucks for semiconductor...

Coating apparatus – Gas or vapor deposition – Work support

Reexamination Certificate

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C156S345510, C361S234000, C279S128000

Reexamination Certificate

active

08043433

ABSTRACT:
The present invention generally provides a high efficiency electrostatic chuck for holding a substrate in a processing volume. The high efficiency electrostatic chuck includes an electrode embedded within a high-purity, thermoplastic member. In particular, the high-purity, thermoplastic member may include a high-purity, polyaryletherketone having an extremely low level of metallic ions present therein. The high-purity, polyaryletherketone has excellent wear resistance, high temperature resistance, plasma resistance, corrosive chemical resistance, electrical stability, and strength as compared to polyimide films used in electrostatic chucks. The present invention also provides a simplified method of manufacturing the high efficiency electrostatic chuck.

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International Search Report and Written Opinion dated Sep. 17, 2009 for International Application No. PCT/US2009/033032.

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