High density semiconductor memory cell and memory array...

Static information storage and retrieval – Systems using particular element – Semiconductive

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C365S185140, C365S185280

Reexamination Certificate

active

06856540

ABSTRACT:
A programmable memory cell comprised of a transistor located at the crosspoint of a column bitline and a row wordline is disclosed. The transistor has its gate formed from the column bitline and its source connected to the row wordline. The memory cell is programmed by applying a voltage potential between the column bitline and the row wordline to produce a programmed n+region in the substrate underlying the gate of the transistor.

REFERENCES:
patent: 3634929 (1972-01-01), Yoshida et al.
patent: 4322822 (1982-03-01), McPherson
patent: 4488262 (1984-12-01), Basire et al.
patent: 4490900 (1985-01-01), Chiu
patent: 4502208 (1985-03-01), McPherson
patent: 4507757 (1985-03-01), McElroy
patent: 4543594 (1985-09-01), Mohsen et al.
patent: 4546273 (1985-10-01), Osman
patent: 4599705 (1986-07-01), Holmberg et al.
patent: 4613886 (1986-09-01), Chwang
patent: 4677742 (1987-07-01), Johnson
patent: 4758986 (1988-07-01), Kuo
patent: 4794562 (1988-12-01), Kato et al.
patent: 4823181 (1989-04-01), Mohsen et al.
patent: 4876220 (1989-10-01), Mohsen et al.
patent: 4899205 (1990-02-01), Hamdy et al.
patent: 4943538 (1990-07-01), Mohsen et al.
patent: 4962342 (1990-10-01), Mead et al.
patent: 5138410 (1992-08-01), Takebuchi
patent: 5150179 (1992-09-01), Gill
patent: 5303185 (1994-04-01), Hazani
patent: 5304871 (1994-04-01), Dharmarajan et al.
patent: 5323342 (1994-06-01), Wada et al.
patent: 5412244 (1995-05-01), Hamdy et al.
patent: 5477499 (1995-12-01), Van Buskirk et al.
patent: 5496756 (1996-03-01), Sharma et al.
patent: 5576568 (1996-11-01), Kowshik
patent: 5578848 (1996-11-01), Kwong et al.
patent: 5586270 (1996-12-01), Rotier et al.
patent: 5587603 (1996-12-01), Kowshik
patent: 5600265 (1997-02-01), El Gamal et al.
patent: 5675541 (1997-10-01), Leterrier
patent: 5675547 (1997-10-01), Koga
patent: 5745417 (1998-04-01), Kobayashi et al.
patent: 5825200 (1998-10-01), Kolze
patent: 5825201 (1998-10-01), Kolze
patent: 5880512 (1999-03-01), Gordon et al.
patent: 5909049 (1999-06-01), McCollum
patent: 5986931 (1999-11-01), Caywood
patent: 5986939 (1999-11-01), Yamada
patent: 6016268 (2000-01-01), Worley
patent: 6034893 (2000-03-01), Mehta
patent: 6040968 (2000-03-01), Duvvury et al.
patent: 6064595 (2000-05-01), Logie et al.
patent: 6084428 (2000-07-01), Kolze et al.
patent: 6097077 (2000-08-01), Gordon et al.
patent: 6153463 (2000-11-01), Wei et al.
patent: 6157568 (2000-12-01), Schmidt
patent: 6166954 (2000-12-01), Chern
patent: 6214666 (2001-04-01), Mehta
patent: 6215140 (2001-04-01), Reisinger et al.
patent: 6218274 (2001-04-01), Komatsu
patent: 6232631 (2001-05-01), Schmidt et al.
patent: 6249809 (2001-06-01), Bro
patent: 6282123 (2001-08-01), Mehta
patent: 6294809 (2001-09-01), Logie
patent: 6297103 (2001-10-01), Ahn et al.
patent: 6304666 (2001-10-01), Warren et al.
patent: 6351428 (2002-02-01), Forbes
patent: 6421293 (2002-07-01), Candelier et al.
patent: 6431456 (2002-08-01), Nishizawa et al.
patent: 6456535 (2002-09-01), Forbes et al.
patent: 6556481 (2003-04-01), Hsu et al.
patent: 6777757 (2004-08-01), Peng et al.
patent: 20010003374 (2001-06-01), Bohmer et al.
patent: 0 295 935 (1988-12-01), None
patent: 61292295 (1986-12-01), None
DeGraaf, C., et al, A Novel High-Density Low-Cost Diode Programmable Read Only Memory, IEEE, 1996.
Miranda, Enrique et al; Analytic Modeling of Leakage Current Through Multiple Breakdown Paths in SiO2 Films; 39thAnnual International Reliability Physics Symposium; Orlando, FL 2001.
Lombardo, S. et al; Softening of Breakdown in Ultra-Thin Gate Oxide nMOSFET's at Low Inversion Layer Density; 39thAnnual International Reliability Physics Symposium; Orlando, FL 2001.
Wu, E.W. et al; Voltage-Dependent Voltage-Acceleration of Oxide Breakdown for Ultra-Thin Oxides; IEEE, 2000.
Rasras, Mahmoud et al; Substrate Hole Current Origin After Oxide Breakdown; IEEE, 2000.
Sune, Jordi et al; Post Soft Breakdown Conduction in SiO2 Gate Oxides; IEEE, 2000.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High density semiconductor memory cell and memory array... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High density semiconductor memory cell and memory array..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High density semiconductor memory cell and memory array... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3500105

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.