High-density plasma-processing tool with toroidal magnetic field

Details High-density plasma-processing tool with toroidal magnetic field High-density plasma-processing tool with toroidal magnetic field

1992-03-18

1996-04-09

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

With treating means

156345, 118723I, C23C 1654

Patent

active

055057802

ABSTRACT:
A high-density plasma-processing reactor with a processing chamber configuration which closes upon itself. The reactor applies a toroidal magnetic field to the plasma discharge which creates magnetic field lines which close upon themselves thereby preventing the magnetized plasma electrons traveling along these magnetic field lines from diffusing to the chamber wall or adjacent magnetic field lines. This electron confinement scheme is expected to result in a plasma density in the 10.sup.12 to 10.sup.13 cm.sup.-3 range. The high density plasma processing reactor includes a plasma processing chamber which forms an enclosed configuration mounted within a plurality of toroidal solenoid coils and containing a plurality of plasma source regions.

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