Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making printing plates
Patent
1990-09-21
1992-06-30
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making printing plates
430325, 430331, 252156, 252541, 252544, 252547, G03C 524, G03C 534
Patent
active
051262304
ABSTRACT:
Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide and an adjunct having a structure selected from: ##STR1## wherein n is 0 or 1; m is 1 or 2; and each R.sup.1 and R.sup.2 is independently selected from hydrogen, methyl, or ethyl, but in Structure I the two R.sup.2 's are not both ethyl. The methods involve use of this composition to develop the indicated photoresists. The addition of an adjunct of the indicated type prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed. Selection of these adjuncts also increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.
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Bauer Carla M.
Bell Kenneth L.
Lazarus Richard M.
Bowers Jr. Charles L.
Doody Patrick A.
Morton International Inc.
White Gerald K.
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