High contact angle topcoat material and use thereof in...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Reexamination Certificate

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C430S271100, C430S272100, C430S273100, C430S311000, C430S313000, C430S325000, C430S326000, C430S330000, C430S907000, C430S910000, C526S242000, C526S245000, C526S248000, C526S279000, C526S281000, C526S282000, C526S288000, C526S328000, C526S328500, C526S329400, C556S009000, C556S012000

Reexamination Certificate

active

08034532

ABSTRACT:
A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.

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