Active solid-state devices (e.g. – transistors – solid-state diode – With means to increase breakdown voltage threshold
Patent
1995-06-07
1997-06-17
Crane, Sara W.
Active solid-state devices (e.g., transistors, solid-state diode
With means to increase breakdown voltage threshold
257491, 257492, H01L 2358
Patent
active
056400403
ABSTRACT:
A high breakdown voltage semiconductor device comprising a semiconductor substrate, an insulating layer formed on the semiconductor substrate, an active layer formed on the insulating layer and made of a high resistance semiconductor of a first conductivity type, a first impurity region of the first conductivity type formed in the active layer, and a second impurity region of a second conductivity type formed in the active layer and spaced apart from the first impurity region by a predetermined distance. The first impurity region is formed of diffusion layers. The diffusion layers are superimposed one upon another and differ in diffusion depth or diffusion window width, or both.
REFERENCES:
patent: 5448100 (1995-09-01), Beasom
Funaki Hideyuki
Matsudai Tomoko
Nakagawa Akio
Omura Ichiro
Yamaguchi Yoshihiro
Crane Sara W.
Kabushiki Kaisha Toshiba
Potter Roy
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