High aspect-ratio X-ray diffractive structure stabilization...

Details High aspect-ratio X-ray diffractive structure stabilization... High aspect-ratio X-ray diffractive structure stabilization...

2011-01-04

2011-01-04

Pritchett, Joshua L (Department: 2872)

Optical: systems and elements

Diffraction

From grating

C359S569000, C378S070000

Reexamination Certificate

active

07864426

ABSTRACT:
A method to stabilize planar nanostructures, for example grating and zone plate lenses that are typically used for directing or focusing x-ray radiation, includes the deposition of a top, stabilizing layer. The structures are typically made on a flat substrate, and therefore are only fixed at the bottom. At high aspect ratio, the stability can be poor since small forces such as electrostatic forces and van de Waals forces that are often present can alter the structure. The top coating of a metallic material such as titanium constrains the nanostructures at the top and at the same time eliminates electrostatic forces and reduces any thermal gradient that may be present across the device.

REFERENCES:
patent: 6510200 (2003-01-01), Martynov et al.
patent: 6815363 (2004-11-01), Yun et al.
patent: 2003/0206340 (2003-11-01), Goldstein
patent: 2005/0243423 (2005-11-01), Nakai et al.
patent: 2006/0127830 (2006-06-01), Deng et al.

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