High absorbance/low reflectance felts with a pattern layer

Details High absorbance/low reflectance felts with a pattern layer High absorbance/low reflectance felts with a pattern layer

1996-04-30

1997-12-02

Lamb, Brenda A.

Paper making and fiber liberation

Apparatus

Running or indefinite length product forming and/or treating...

162900, 428137, D21F 300

Patent

active

056931875

ABSTRACT:
An apparatus for making paper. The apparatus comprises a felt and a pattern layer joined to the felt. The felt has a relatively high UV absorbance. Such a high UV absorbance prevents the actinic radiation applied to cure the pattern layer from scattering when the radiation penetrates the surface of the pattern layer. By limiting the scattering of radiation beneath the surface of the pattern layer, extraneous cured pattern layer material is minimized in the regions of the felt where it is desired not to have pattern layer material.

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