Heterojunction field effect transistor and method of fabricating

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having schottky gate

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

438167, 438571, H01L 21338

Patent

active

060906499

ABSTRACT:
A Schottky barrier layer in separate regions between a source electrode and a gate electrode and between a drain electrode and the gate electrode is completely covered with an etching stopper layer. The gate electrode is separated from a cap layer.

REFERENCES:
patent: 5043777 (1991-08-01), Sriram
patent: 5352909 (1994-10-01), Hori
patent: 5480829 (1996-01-01), Abrokwah et al.
patent: 5508535 (1996-04-01), Nakanishi
patent: 5639677 (1997-06-01), Lee et al.
patent: 5643811 (1997-07-01), Hasegawa
patent: 5663583 (1997-09-01), Matloubian et al.
patent: 5686740 (1997-11-01), Hida
patent: 5702975 (1997-12-01), Yoon et al.
patent: 5739557 (1998-04-01), O'Neil, II et al.
patent: 5770489 (1998-06-01), Onda
patent: 5786244 (1998-07-01), Chang
patent: 5811844 (1998-09-01), Kuo et al.
patent: 5837570 (1998-11-01), Asano
patent: 5869364 (1999-02-01), Nakano et al.
Patent Abstracts of Japan, vol. 018, no. 403, Jul. 27, 1994, p. 328.
Adeside I et al., Reactive Ion Etching of Submicrometer Structes In Inp, Sep. 11-14, 1988, no. Symp 15, Sep. 11, 1988, pp. 425-430.
Enoki T et al., Topical Workshop on Heterostruture Microelectronics, Aug. 18-21, 1996, vol. 41, no. 10, pp. 1651-1656.
A Recessed-Gate InAIAs
+ -InP HFET with an InP Etch-Stop Layer, Greenberg et al., IEEE Electron Device Letters, vol. 13, No. 3, pp. 137-139, Mar. 1992.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Heterojunction field effect transistor and method of fabricating does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Heterojunction field effect transistor and method of fabricating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Heterojunction field effect transistor and method of fabricating will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2035737

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.