Hermetic coatings by heating hydrogen silsesquinoxane resin in a

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma

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427579, 427227, 427240, 427255, 4273762, 427377, 4274071, 4274198, 427421, 4274301, B05D 302

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053805674

ABSTRACT:
The present invention relates to a method of forming a coating on a substrate in the absence of oxygen. The method comprises coating the substrate with a solution comprising a solvent and hydrogen silsesquioxane resin. The solvent is evaporated and a preceramic coating thereby deposited on the substrate. The preceramic coating is then heated to a temperature of between about 500.degree. up to about 1000.degree. C. under an inert gas atmosphere. The process of the invention is useful for forming protective coatings on any substrate prone to oxidation. The present invention also relates to the formation of additional coatings on the coating formed above.

REFERENCES:
patent: 4460639 (1984-07-01), Chi et al.
patent: 4822697 (1989-04-01), Haluska et al.
patent: 4847162 (1989-07-01), Haluska et al.
Wagner et al., "Silicon Oxyhydride in Industrial and Engineering Chemistry" 44(2) 321-326 (1952).

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