Heater assembly with dual temperature control for use in PVD/CVD

Details Heater assembly with dual temperature control for use in PVD/CVD Heater assembly with dual temperature control for use in PVD/CVD

1996-09-25

1998-09-22

Jeffery, John A.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219390, 392418, 118728, 165 61, 16510419, 438799, H01L 21324, H01L 2168, C23C 1600, F28F 702

Patent

active

058117628

ABSTRACT:
A heat pedestal is described for use in a physical vapor deposition/chemical vapor deposition system in which cooling gas, cooling water and heated gas are used to bring a semiconductor wafer to the desired low or high temperature. Use of the apparatus and method described leads to a very rapid transition from one temperature to another. Also achieved is a precise temperature control over a wide range yielding increased flexibility of process control.

REFERENCES:
patent: 4512391 (1985-04-01), Harra
patent: 5113929 (1992-05-01), Nakagawa et al.
patent: 5434110 (1995-07-01), Foster et al.
patent: 5467220 (1995-11-01), Xu
patent: 5511608 (1996-04-01), Boyd
patent: 5562947 (1996-10-01), White et al.
patent: 5588827 (1996-12-01), Muka
patent: 5595241 (1997-01-01), Jelinek

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