Heated gas box for PECVD applications

Details Heated gas box for PECVD applications Heated gas box for PECVD applications

2004-08-03

2009-12-08

Zervigon, Rudy (Department: 1792)

Coating apparatus

Gas or vapor deposition

C156S345290, C156S345330

Reexamination Certificate

active

07628863

ABSTRACT:
A method and apparatus for a chamber for chemical vapor deposition on a substrate in a processing region comprising a gas box having a heated lid comprising a gas inlet passage, and a face plate connected to the heated lid positioned to conduct gas from the heated gas box to a substrate processing region. Also, a method for providing heat to a chemical vapor deposition chamber comprising supplying heat to a lid of a gas box, and heating a face plate connected to the gas box by heat transfer from the lid.

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