Heat treatment processing apparatus and cleaning method thereof

Details Heat treatment processing apparatus and cleaning method thereof Heat treatment processing apparatus and cleaning method thereof

1995-03-28

1996-09-10

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

With treating means

118715, 432241, 432205, C23C 1600

Patent

active

055542263

ABSTRACT:
While the interior of a reaction vessel is being deaerated by a first vacuum pump, an inert gas is supplied from an upstream side (reaction gas bottle side) of a flow rate control unit (MFC) to a reaction gas supply pipe. Thus, a reaction gas is substituted with the inert gas. A passageway downstream of the MFC is closed and the interior of the pipe is deaerated from the upstream side through a bypass pipe so that a predetermined degree of vacuum is obtained. Thus, the gas substituting efficiency can be improved. The interior of the reaction vessel and the interior of the reaction gas supply pipe are quickly deaerated without an influence of resistance of the MFC. The inert gas substitution process and the deaerating process are repeated for 10 cycles or more.

REFERENCES:
patent: 4226208 (1980-10-01), Nishida
patent: 4716852 (1988-01-01), Tsujii
patent: 4717596 (1988-01-01), Barbee
patent: 5069930 (1991-12-01), Hussla
patent: 5091207 (1992-02-01), Tanaka
patent: 5186120 (1993-02-01), Ohnishi
patent: 5190913 (1993-03-01), Higashiyama
patent: 5250323 (1993-10-01), Miyazaki
patent: 5261961 (1993-11-01), Takasu
patent: 5427625 (1995-06-01), Okase
patent: 5458689 (1995-10-01), Saito

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