Heat treatment method

Details Heat treatment method Heat treatment method

1996-09-05

1998-09-29

Walberg, Teresa J.

Heating

Processes of heating or heater operation

Including preparing or arranging work for heating

432 5, 432241, 432152, F27D 500

Patent

active

058138510

ABSTRACT:
When a wafer boat having wafers, objects to be treated, placed thereon is loaded into a reaction tube, which is then raised in temperature by a heating section at a speed of 50.degree. C./min or more, a pressure reduction degree of the reaction tube is lowered or a hydrogen gas is supplied. A surface roughness of a portion in contact with the wafers on the wafer boat is 50 .mu.m or less. Thereby, a heat transfer coefficient relative to the wafers is improved to suppress an in-plane temperature difference smaller. Accordingly, when the objects to be treated are raised in temperature in the reaction tube for heat treatment, it is possible to suppress the in-plane temperature difference of the substances to be smaller to prevent an occurrence of a slip or warp which leads to the lowering of a yield.

REFERENCES:
patent: 5249960 (1993-10-01), Monoe
patent: 5273423 (1993-12-01), Shiraiwa
patent: 5277579 (1994-01-01), Takanabe
patent: 5328360 (1994-07-01), Yokokawa
patent: 5360336 (1994-11-01), Monoe
patent: 5445521 (1995-08-01), Yamaguchi et al.
patent: 5507639 (1996-04-01), Monoe
patent: 5525057 (1996-06-01), Monoe
patent: 5556275 (1996-09-01), Sakata et al.
patent: 5578132 (1996-11-01), Yamaga et al.

Affiliated with

Also associated with

Rating

Heat treatment method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Heat treatment method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Heat treatment method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-681034