Heating – Accessory means for holding – shielding or supporting work...
Reexamination Certificate
2007-01-16
2007-01-16
Wilson, Gregory (Department: 3749)
Heating
Accessory means for holding, shielding or supporting work...
C432S259000, C211S041180
Reexamination Certificate
active
10771225
ABSTRACT:
This invention provides a heat treatment jig for semiconductor silicon substrates, which, in respective heat treatment of hydrogen annealing or argon annealing, can handle enlargement of the diameter of wafers to be treated and can also prevent slipping and dislocations that occur as a result of the stress caused by the weight of the wafer itself or the deflection of the heat treatment jig itself.
REFERENCES:
patent: 2233434 (1941-03-01), Smith
patent: 5669513 (1997-09-01), Oh et al.
patent: 5718574 (1998-02-01), Shimazu
patent: 5820367 (1998-10-01), Osawa
patent: 6375749 (2002-04-01), Boydston et al.
patent: 6474987 (2002-11-01), Nakai et al.
patent: 6576064 (2003-06-01), Griffiths et al.
patent: 6962477 (2005-11-01), Tateyama et al.
patent: 2003/0170583 (2003-09-01), Nakashima et al.
patent: 05-152228 (1993-06-01), None
patent: 06-151347 (1994-05-01), None
patent: 2001-060559 (2001-03-01), None
patent: 2001-102318 (2001-04-01), None
patent: 2003-37112 (2003-02-01), None
Patent Abstracts of Japan for JP06-151347 published on May 31, 1994.
Patent Abstracts of Japan for JP2001-102318 published on Apr. 13, 2001.
Patent Abstracts of Japan for JP2001-060559 published on Mar. 6, 2001.
Patent Abstracts of Japan for JP05-152228 published on Jun. 18, 1993.
Patent Abstracts of Japan for JP2003-037112 published on Feb. 7, 2003.
Darby & Darby
Sumitomo Mitsubishi Silicon Corporation
Wilson Gregory
LandOfFree
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