Heat treatment device

Details Heat treatment device Heat treatment device

2005-08-30

2005-08-30

Lund, Jeffrie R. (Department: 1763)

Coating apparatus

Gas or vapor deposition

C118S724000, C118S725000, C156S345290, C432S241000

Reexamination Certificate

active

06936108

ABSTRACT:
A film-forming unit of the invention includes: a processing furnace, gas-supplying means that supplies a process gas into the processing furnace, heating means that heats an inside of the processing furnace to a predetermined process-temperature, and a normal-pressure gas-discharging system for discharging gas from the processing furnace at a predetermined discharging-pressure that is near to an atmospheric pressure. A valve is provided in the normal-pressure gas-discharging system, the valve being adjustably caused to open and close, a pressure of the gas through the valve being also adjustable. A pressure sensor detects a discharging-pressure in the normal-pressure gas-discharging system. A controller controls the valve based on the pressure detected by the pressure sensor. According to the feature, a stable control can be achieved without necessity of introducing atmospheric air or introducing any inert gas. In addition, a structure of the gas-discharging system is simplified, and reduction of costs for the whole unit is achieved.

REFERENCES:
patent: 4674443 (1987-06-01), Furukawa et al.
patent: 5359148 (1994-10-01), Okase et al.
patent: 5415585 (1995-05-01), Miyagi
patent: 5421894 (1995-06-01), Lei et al.
patent: 5433784 (1995-07-01), Miyagi et al.
patent: 5445521 (1995-08-01), Yamaguchi et al.
patent: 5484484 (1996-01-01), Yamaga et al.
patent: 5567149 (1996-10-01), Hansotte et al.
patent: 5575853 (1996-11-01), Arami et al.
patent: 5578132 (1996-11-01), Yamaga et al.
patent: 5750436 (1998-05-01), Yamaga et al.
patent: 5777300 (1998-07-01), Homma et al.
patent: 5851293 (1998-12-01), Lane et al.
patent: 5888579 (1999-03-01), Lun
patent: 6106626 (2000-08-01), Guan et al.
patent: 6139642 (2000-10-01), Shimahara et al.
patent: 6159298 (2000-12-01), Saito
patent: 6165272 (2000-12-01), Liu
patent: 6251169 (2001-06-01), Shimomura et al.
patent: 6287984 (2001-09-01), Horie
patent: 6578600 (2003-06-01), Young, Jr.
patent: 2001/0029889 (2001-10-01), Holcomb et al.
patent: 2002/0020433 (2002-02-01), Suemura et al.
patent: 2003/0127052 (2003-07-01), Kim et al.
patent: 2003/0170949 (2003-09-01), Chouno et al.
patent: 2004/0002224 (2004-01-01), Chono et al.
patent: 2004/0069226 (2004-04-01), Yoshida et al.
patent: 2004/0110106 (2004-06-01), Mokuo
patent: 2004/0175666 (2004-09-01), Saito
patent: 1 069 597 (2001-01-01), None
patent: 63-17520 (1988-01-01), None
patent: 63-210501 (1988-09-01), None
patent: 6-26248 (1994-04-01), None
patent: 7-58032 (1995-03-01), None
patent: 8-139085 (1996-05-01), None
patent: 11-233505 (1999-08-01), None
PCT Notification of Transmittal of Copies of Translation of the International Preliminary Examination Report (PCT/IB/338) issued for PCT/JP00/07886.
International Preliminary Examination Report (PCT/IPEA/409) (translated) issued for PCT/JP00/07886.
International Search Report mailed Feb. 13, 2002 (PCT/JP00/07888).

Affiliated with

Also associated with

Rating

Heat treatment device does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Heat treatment device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Heat treatment device will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3523577