Heat treatment apparatus utilizing flat heating elements for tre

Details Heat treatment apparatus utilizing flat heating elements for tre Heat treatment apparatus utilizing flat heating elements for tre

1994-05-16

1996-07-16

Jeffery, John A.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

392418, 118724, 118500, H01L 21205, H01L 2122, H01L 21285, H01L 2131

Patent

active

055369189

ABSTRACT:
A heat treatment apparatus including a flat heat source having a plural number of ring-shaped heating units of different diameters arranged concentrically and so as to face a processing surface of a semiconductor wafer for example, a heat control portion which performs either independent or batch control of a plural number of ring-shaped heating units, a process tube which houses the object for processing, and a movement mechanism which brings a processing surface of the object for processing and the flat heat source into relative proximity. By this configuration, it is possible to have fast heat treatment such as oxidation and diffusion processing, or CVD processing, to a uniform temperature for the entire processing surface of a flat object for processing.

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patent: 5308955 (1994-05-01), Watanabe
patent: 5393349 (1995-02-01), Ohkase

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