Heat-treating apparatus and heat-treating method

Coating apparatus – Gas or vapor deposition – With treating means

Reexamination Certificate

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Details

C118S72300R, C118S715000, C029S025010

Reexamination Certificate

active

06991684

ABSTRACT:
A heater plate, which has a wafer W mounted thereon and which includes a heater in its interior, is placed on a cooling block including a coolant chamber in its interior. The cooling block includes a gas introduction pipe passing therethrough. The gas introduction pipe is connected to a space between the heater plate and the cooling block to make it possible to supply He gas as thermal conduction gas to the space. A gas suction pipe34is connected to the space to make it possible to suck He gas.

REFERENCES:
patent: 5567267 (1996-10-01), Kazama et al.
patent: 5791895 (1998-08-01), Kyung et al.
patent: 2002/0007795 (2002-01-01), Bailey et al.
patent: 6244143 (1994-09-01), None
patent: 7078766 (1995-03-01), None
patent: 7153706 (1995-06-01), None
patent: 11-323549 (1999-11-01), None
patent: 2001196152 (2001-07-01), None
patent: 00/26960 (2000-05-01), None

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