Heat sensitive imaging element and a method for producing lithog

Details Heat sensitive imaging element and a method for producing lithog Heat sensitive imaging element and a method for producing lithog

1998-05-19

2000-07-25

Baxter, Janet

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making printing plates

G03F 7004

Patent

active

060935197

ABSTRACT:
According to the present invention there is provided a heat sensitive recording material having on a support a recording layer containing a homogeneous ink accepting phase and an ink abhesive phase, characterized in that said ink abhesive phase comprises a silicon based polymer.

REFERENCES:
patent: 4010687 (1977-03-01), Schank et al.
patent: 4012254 (1977-03-01), Crystal
patent: 4259905 (1981-04-01), Abiko et al.
patent: 4686138 (1987-08-01), Toyama et al.
Patent Abstracts of Japan, vol. 012, No. 227 (M-713), Jun. 28, 1988 and JP 63 022687 A (Toppan Printing Co Ltd), Jan. 30, 1988.
Research Disclosure, Feb. 1974, pp. 24-28, XP002019315.

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