Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Reexamination Certificate
2008-02-27
2009-12-15
Owens, Douglas W (Department: 2821)
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
C315S111210, C315S111410, C219S121360, C219S121480, C219S121500, C607S096000, C607S098000, C607S099000, C606S041000, C427S595000
Reexamination Certificate
active
07633231
ABSTRACT:
A device for generating atmospheric pressure cold plasma inside a hand-held unit discharges cold plasma with simultaneously different rf wavelengths and their harmonics. The device includes an rf tuning network that is powered by a low-voltage power supply connected to a series of high-voltage coils and capacitors. The rf energy signal is transferred to a primary containment chamber and dispersed through an electrode plate network of various sizes and thicknesses to create multiple frequencies. Helium gas is introduced into the first primary containment chamber, where electron separation is initiated. The energized gas flows into a secondary magnetic compression chamber, where a balanced frequency network grid with capacitance creates the final electron separation, which is inverted magnetically and exits through an orifice with a nozzle. The cold plasma thus generated has been shown to be capable of accelerating a healing process in flesh wounds on animal laboratory specimens.
REFERENCES:
patent: 2927322 (1960-03-01), Simon et al.
patent: 3432722 (1969-03-01), Naydan et al.
patent: 3487414 (1969-12-01), Booker
patent: 3735591 (1973-05-01), Burkhart
patent: 4088926 (1978-05-01), Fletcher et al.
patent: 4380320 (1983-04-01), Hollstein et al.
patent: 4422013 (1983-12-01), Turchi et al.
patent: 5079482 (1992-01-01), Villecco et al.
patent: 5216330 (1993-06-01), Ahonen
patent: 5225740 (1993-07-01), Ohkawa
patent: 5304888 (1994-04-01), Gesley et al.
patent: 5876663 (1999-03-01), Laroussi
patent: 5883470 (1999-03-01), Hatakeyama et al.
patent: 5909086 (1999-06-01), Kim et al.
patent: 5977715 (1999-11-01), Li et al.
patent: 6204605 (2001-03-01), Laroussi et al.
patent: 6262523 (2001-07-01), Selwyn et al.
patent: 6611106 (2003-08-01), Monkhorst et al.
patent: 6956329 (2005-10-01), Brooks et al.
patent: 6958063 (2005-10-01), Soll et al.
patent: 7006874 (2006-02-01), Knowlton et al.
patent: 7081711 (2006-07-01), Glidden et al.
patent: 7094314 (2006-08-01), Kurunczi
patent: 7271363 (2007-09-01), Lee et al.
patent: 2003/0222586 (2003-12-01), Brooks et al.
patent: 2005/0088101 (2005-04-01), Glidden et al.
patent: 2006/0189976 (2006-08-01), Karni et al.
patent: 2006116252 (2006-11-01), None
Dumé, Belle, “Cold Plasmas Destroy Bacteria,” article, [online], [retrieved on Jan. 5, 2007], Retrieved from the PhysicsWeb website using Internet <URL:http://physicsweb.org/articles
ews7/4/19>.
Gould, Phillip and Eyler, Edward, “Ultracold Plasmas Come of Age,” article, [online], [retrieved on Jan. 5, 2007], Retrieved from the PhysicsWeb website using Internet <URL:http://physicsweb.org/articles/world/14/3/3>.
Schultz, James, “Cold Plasma Ignites Hot Applications,” article, [online], [retrieved on Jan. 5, 2007], Retrieved from the Old Dominion University website using Internet <URL:http://www.odu.edu/ao/instadv/quest/coldplasma.html>.
Lamba, Bikram, “Advent of Cold Plasma,” article, [online], [retrieved on Jan. 5, 2007], Retrieved from the PhysOrg.com website using Internet <URL:http://www.physorg.com/printnews.php?newsid=6688>.
Alemu Ephrem
Cold Plasma Medical Technologies, Inc.
Hartt Jacqueline E.
Lowndes Drosdick Doster, Kantor & Reed, P.A.
Owens Douglas W
LandOfFree
Harmonic cold plasma device and associated methods does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Harmonic cold plasma device and associated methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Harmonic cold plasma device and associated methods will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4111133