Hard etch mask

Details Hard etch mask Hard etch mask

1997-09-30

2000-02-01

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

06020091&

ABSTRACT:
A hard etch mask comprising phosphorus doped silicate glass for reactive ion etching of a substrate to form trenches therein.

REFERENCES:
patent: 5545588 (1996-08-01), Yoo
patent: 5614431 (1997-03-01), DeBrosse
patent: 5776808 (1996-12-01), Muller et al.

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