Halftone-type phase-shift mask blank, and halftone-type...

Details Halftone-type phase-shift mask blank, and halftone-type... Halftone-type phase-shift mask blank, and halftone-type...

2006-03-14

2006-03-14

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07011910

ABSTRACT:
In a halftone-type phase-shift mask blank having a phase shifter film5, the phase shifter film5has a phase adjustment layer4for primarily controlling the phase of exposure light, and a transmissivity adjustment layer3which is formed between a transparent substrate2and the phase adjustment layer4and primarily controls the transmissivity of exposure light. The transmissivity adjustment layer3has a thickness of 90 angstroms or less.

REFERENCES:
patent: 5538816 (1996-07-01), Hashimoto et al.
patent: 6309780 (2001-10-01), Smith
patent: 6641958 (2003-11-01), Inazuki et al.
patent: 6682860 (2004-01-01), Angelopoulos et al.
patent: 6730445 (2004-05-01), Angelopoulos et al.
patent: 2001-174973 (2001-06-01), None

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